Ultimate Vacuum

Residual Gas Analyzers

Residual gas analyzers are routinely used for vacuum monitoring and troubleshooting in a wide range of applications. We offer a broad selection of RGAs to address the specific needs of applications ranging from vacuum coating and thin film technology, to accelerators and high energy physics. Options include extenders for operation in harsh environments (i.e. in the presence of ionizing radiation), high resolution sensors for the study of low molecular weight gas species, and special analyzer options for UHV studies.

e-Vision 2, MicroVision 2

The e-Vision 2 and Microvision 2 are the latest in RGA innovation from MKS. These analyzers are designed to meet all of the traditional requirements for RGA sensors, but with data collection at speeds unachievable with previous generation technologies. With the ability to collect data at millisecond speeds per data point, even when measuring over the full dynamic range, these RGAs are robust, reliable, and will support a wide range of process applications.

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HPQ IP Web-Enabled High Pressure RGA

The HPQ IP has an integrated Ethernet interface and embedded web server enabling direct operation over any TCP/IP network, including the internet. The analyzer is extremely compact with an insertion length of less than 1.0" into the process chamber, and the RGA electronics are housed in a compact control module, which mounts directly onto the analyzer.

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Built-in Web Server Application

A web interface using industry standard technology that allows control of the RGA as well as calibration, operation and data export through a non platform-specific web browser from anywhere on a network.

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Easyview General Purpose RGA Software Platform

The latest RGA software platform designed for simplicity in installation and operation, the EasyView is an interactive, icon-driven package; a 32-bit, network-compatible application that capitalizes on the latest Microsoft operating systems (Windows 2000, Professional, XP, Vista, and Windows 7).

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Process Eye Professional Flexible, Recipe-Driven RGA Software

A recipe-based RGA control platform with full network compatibility, Process Eye Professional software offers users almost unlimited flexibility with the acquisition, display and response to RGA data. Process Eye Professional software is ideal for process monitoring and more demanding R&D applications.

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TOOLweb RGA

Using the TOOLweb RGA sensor integration option for process tools, a range of RGAs and other sensors can be used as chamber monitors in a completely automated process environment. TOOLweb RGA maintains a constant overview of tool activities with all sensor data being framed by wafer logistics before alarm models are applied. Full alarm and data reporting to the FAB host and FDC are available so real-time monitoring of chamber conditions and flagging of any process excursions from ideal conditions is possible.

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Resist-Torr / 300mm Resist-Torr

For 200mm & 300mm Technologies

Tool particle levels and PVD processes can be negatively impacted by photoresist remaining on wafers from previous processing steps. The Resist-Torr and 300mm Resist-Torr® monitors photoresist and solvent residues remaining on a wafer from upstream processes, before they enter a PVD chamber. An easy-to-understand metric of contamination levels, the PR Index value, is calculated automatically and the tool is alarmed if levels exceed critical limits.

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Vision 1000-C/E for CVD & Etch Processes Vision 1000-I for Implant Processes

Designed with process optimization and tool qualification in mind, the Vision 1000-C/E™ process monitors provide a window into CVD and etch processes. Monitoring capability spans the range of applications from chamber clean, passivation and deposition sequences for CVD and ALD processes, to etch rate variations for a wide variety of etch processes. Providing an early warning of degradation in base vacuum conditions in ion implanters, the Vision 1000-I™ monitor can improve implanter productivity.

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Vision 1000-B

Transfer, Buffer & Loader Chamber Process Monitor

Film characteristics can be negatively impacted by changes in background gases and contamination between chambers. The Vision 1000-B™ transfer, buffer and loader chamber modules automatically monitor vacuum pumpdown cycles,base vacuum and leak levels during tool operation synchronized to slit valve and wafer movements. Automatic data summary reports based on tool wafer logistics provide the opportunity for process interdiction and valuable information on tool performance over defined periods of time.

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HPQ2 and HPQ2S PVD Process Monitor

Monitoring PVD processes during both wafer processing and baseline conditions, the HPQ-2S can highlight issues associated with gas composition and process contaminants, including those linked to tool component failure.

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Gas Analysis—Mass Spectrometer

This gas analyzer offers the versatility of state-of-the-art quadrupole mass spectrometry in a convenient bench-top configuration. Incorporating an Ethernet interface, Cirrus gas monitors can be operated from a local PC or connected directly into an Ethernet network hub or switch for remote operation.

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Gas Analysis—FTIR and NDIR

FTIR and NDIR-based analyzer products from MKS are capable of ppb to ppm sensitivity for multiple gas species in a variety of applications, such as stack emissions monitoring, continuous emissions monitoring (CEM), process monitoring, formaldehyde emissions monitoring, and purity monitoring.

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