MKS, ENI® Products RF Power Generators provide reliable solid state power for many thin film applications. Plasma generators are vital components in the manufacture of semiconductor devices and integrated circuits (ICs), optical data storage components and media, solar cells and flat panel display products. ENI RF Generators combined with our Impedance Matching Network form a complete RF Delivery System.
13.56 MHz RF Plasma Generators
The SurePower® platform of RF plasma generators is the most advanced class of 13.56 MHz generators commercially available. This generator’s architecture incorporates state-of-the-art RF topologies, patented intrinsic power amplifier protection, improved design margins, and an embedded V/I Probe sensor to achieve the highest reliability, reproducibility, and accuracy of any generator in the marketplace today. SurePower generators range in power from 1.5kW to 15.0kW and are available with optional auto-frequency tuning. SurePower operates on AC mains voltages of 208 or 400/480.
RF Plasma Generator Platform
The Spectrum® RF Plasma Generator platform includes 1.5 to 11kW power levels in mid and high level frequencies. The Spectrum Series offers precise power control, high reliability and exceptional RF power density. Spectrum RF Plasma Generators are available with automatic frequency tuning and are designed to continuously capture internal operating conditions as a means of providing diagnostic analysis. Pulsing up to 10KHz and two-level pulsing is an available option for the 2MHz Spectrum product line.
RF Plasma Generators
The GHW and Nova RF Plasma Generator platforms are designed for reliable thin film and other plasma applications. Products range from mid to high level frequencies with power levels from 1.25kW to 5.0kW. The DSP-based (Digital Signal Processing) power control system monitors internal subsystem status and provides built-in diagnostics and failsafe memory. GHW series operates on AC mains voltages of 208 or 400/480.
DC Plasma Generators
The reliable Optima continuous DC power supplies are available in output power levels from 5kW to 60kW and higher. This is done by combining master and slave units to achieve the total required output power. Sensing circuitry monitors the combined output of master and slave units to maintain exceptional power accuracy and linearity over all power levels. The advanced circuitry design reduces arc energy thus reducing particulates to enhance process yield.
Pulsed DC Generators
The RPDG series is a family of pulsed DC generators in power levels from 5kW to 10kW in a single 3U chassis. RPDG generators are also available in output power levels from 20kW to 100kW utilizing a pulsed master generator driving multiple DC slave generators. RPDG generators provide asymmetric bipolar and unipolar pulsed DC power while maintaining the exceptional accuracy, repeatability and flexibility of the Optima® continuous DC generators. User-adjustable frequency and duty cycle controls can optimize complex film uniformity and quality. Reverse-bias voltage and programmable duty cycle allow additional energy into the plasma, improving ionization and density.
Impedance Matching Network
Matchwork Impedance matching networks provide efficient, quick tuning of your RF generator for applications such as PECVD, HDPCVD and etch. MKS line of "off-the-shelf" and customized automatic matching networks provides fast and efficient impedance matching for all of your solar, semiconductor, and flat panel applications.
Impedance Matching Network
nd stepper motor drive technology to produce fast, accurate and repeatable matching. MKS automatic tuning matching networks quickly transform plasma impedances to 50 ohms to maximize power transfer to your chamber.
Impedance Matching Network
MKS matching networks can be operated in three tuning modes. Fully automatic mode where the match continuously tunes as the plasma impedance changes, manual mode to allow the operator to adjust the capacitors during process, and preset mode when the operator has knowledge of various load conditions and wants to set the capacitor positions near their final matched values before the match automatically fine tunes to the final position.
