Mass Flow Controllers

Enabling our customers to bring their products and processes to market faster, more reliably, and more cost effectively is at the heart of our mass flow controller (MFC)design philosophy. The MKS family of MFCs measure and control the flow of critical gases in a wide variety of applications, such as semiconductor manufacturing, optical coatings and flat panel display manufacturing. With features, functionality and performances to meet virtually any need, customers can expect reduced cost of ownership and better tool and process performance.

ALTA Series Digital Mass Flow Controller

Designed for the most challenging semiconductor and high purity thin-film applications, the ALTA Series of digital MFCs has several technological enhancements, including multi-range, multi-gas capability to improve cost of ownership and to increase tool throughput in a variety of applications. Find more information here.

πMFC Pressure-Insensitive MFC

This next generation controller includes technology improvements in functionality and performance to increase tool throughput in semiconductor and high purity thin-film applications. Real-time flow control that is insensitive to upstream and downstream pressure disturbances is provided through advanced digital algorithms. Complimentary Ethernet interface is used for e-diagnostics. Find more information here.

Mass-Flo Series Mass Flow Controller

Configuration flexibility is coupled with superior performance in the MKS family of Mass-Flo® MFCs. Field-proven to provide users with cost effective, precise flow control, these MFCs are widely used in a variety of diverse, general purpose gas delivery applications and feature robust, reliable designs to reduce system downtime while lowering overall costs. Find more information here.

DPC Dual-Zone Pressure Controller

Designed to reduce the overall cost of ownership of pressure control subsystems, MKS’ DPC integrates the necessary components into a single package. This pressure controller provides the needed functionality—independent pressure control and mass flow metering of two distinct volumes—in a reduced size, less complex and more cost-effective form. Find more information here.

Tru-Flo Mass Flow Verifier

The Tru-Flo Mass Flow Verifier is a fully integrated diagnostic instrument that measures a pressure rate-of-rise to determine mass flow to within ±1% of Reading. This model consists of a small gas volume, an MKS Baratron pressure sensor, shut off valves, and control electronics combined into a single compact package. The Tru-Flo MFV can be easily incorporated into a process tool gas panel and communicates with a tool host computer via an RS-232 interface.Find more information here.

πPC Integrated Pressure Controller

The πPC90 Pressure Controller is a pressure control system designed for a wide range of pressure and flow conditions. It contains a capacitance manometer, normally closed or normally open control valve, and closed–loop control electronics. The πPC99 with Integral Mass Flow Meter provides pressure measurement and control while monitoring mass flow rates for critical process applications.Find more information here.

DELTA II Flow Ratio Controller

The DELTA II flow ratio controller, with its advanced performance and compact design, is the second generation of MKS industry-leading DELTA controllers. At ratios specified by the user, the DELTA II divides and controls mixed process gas flows within a process chamber to maximize process uniformity and repeatability.Find more information here.

1150C and 1152C Vapor Pressure Source Delivery System

The 1150 Series products provide controlled amounts of vapor from a low vapor pressure liquid source precursor to the process chamber at rates consistent with high throughput requirements. Suitable for advanced CVD precursors, the 1150 Series does not require carrier gas to deliver the precursor vapors, lowering cost of ownership and reducing system complexity.Find more information here.

VoDM Vapor on Demand Module

Designed to reliably deliver precise amounts of water vapor into photoresist strip and post-metal etch passivation processes, the VoDM™ offers increased functionality with reduced system complexity and maintenance over discrete, multi-component systems.Find more information here.